Large photosensitivity in SnO2/SiO2 thin film fabricated by sol-gel method

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Large photosensitivity in SnO2/SiO2 thin film fabricated by sol-gel method

机译：溶胶-凝胶法制备的SnO2 / SiO2薄膜的光敏性大

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SnO2/SiO2(90%molSnO2)thinfilmwaspreparedonthesilicasubstratebysol-gelmethod.TheSnO2/SiO2thinfilmwasirradiatedbyxenonlamp.Thenthetransmissionspectraofthesampleweremeasured.Therefractive-indexexpressionswerefiguredoutforirradiatedandnon-irradiatedSnO2/SiO2thinfilm,respectively.Accordingtorefractiveindexcurves,therefractiveindexchangebetweenirradiatedandnon-irradiatedthinfilmwasapproximatelyupto0.05.

机译：的SnO 2 /二氧化硅（90％molSnO2）thinfilmwaspreparedonthesilicasubstratebysol-gelmethod.TheSnO2 / SiO2thinfilmwasirradiatedbyxenonlamp.Thenthetransmissionspectraofthesampleweremeasured.Therefractive-indexexpressionswerefiguredoutforirradiatedandnon-irradiatedSnO2 / SiO2thinfilm，respectively.Accordingtorefractiveindexcurves，therefractiveindexchangebetweenirradiatedandnon-irradiatedthinfilmwasapproximatelyupto0.05。

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《Optoelectronics and Advanced Materials-Rapid Communications 》 |2012年第2012期| 共页
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Large photosensitivity in SnO2/SiO2 thin film fabricated by sol-gel method

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