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Study of DNA damage caused by dipyrone in presence of some transition metal ions

机译:在某些过渡金属离子存在下由双嘧啶引起的DNA损伤的研究

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The DNA damage in the presence of dipyrone (used as its sodium salt, NaDip) and some transition metal ions in an air saturated ([O"2]~0.25mM) non-buffered solution at T=(25.0+/-0.5)^oC was investigated by agarose gel electrophoresis. As metal ions Cu^2^+, Fe^3^+, Ni^2^+ and Mn^3^+ were selected and evaluated in the present study because of the important role they play in a biological system. pUC19 plasmid DNA damage-induced by NaDip (80-600@mM) was observed in the presence of 100@mM Cu^2^+. The damage was proportional to the NaDip concentration provided that the order of addition of reagents (pUC19 plasmid DNA+Cu^2^++NaDip) is obeyed. Addition in the reaction medium of ligands for Cu^2^+ and Cu^+, respectively EDTA and neocuproine, promoted total inhibition or reduction of the pUC19 plasmid DNA damage suggesting the involvement of the Cu^2^+/Cu^+ cycle. Besides, the decrease in the pUC19 plasmid DNA damage after addition of catalase (1.0x10^-^4mg@mL^-^1) in the same reaction medium indicates that H"2O"2 is also involved in the damage process. In NaDip concentration range (80-600@mM), and under same the experimental conditions, it was not possible to conclude whether there was pUC19 plasmid DNA damage caused by 10@mM Fe^3^+. No damage was observed in the presence of Mn^3^+ or Ni^2^+. Although the technique used in this study is sensitive to detect the pUC19 plasmid DNA damage it was not possible to identify in which DNA base this damage occurs. Further studies with other techniques should be made to unambiguously identify the oxidative intermediates that are responsible for the DNA damage. As far as we know, this is the first study dealing with the pUC19 plasmid DNA damage-induced by NaDip in presence of copper, iron, nickel and manganese ions.
机译:在空气饱和([O“ 2]〜0.25mM)非缓冲溶液中T =(25.0 +/- 0.5)下,存在双嘧啶(用作其钠盐,NaDip)和一些过渡金属离子的情况下,DNA受到破坏通过琼脂糖凝胶电泳对^ oC进行了研究,本研究选择了金属离子Cu ^ 2 ^ +,Fe ^ 3 ^ +,Ni ^ 2 ^ +和Mn ^ 3 ^ +并对其进行了评价。在生物系统中,观察到在100 @ mM Cu ^ 2 ^ +存在下NaDip(80-600 @ mM)诱导的pUC19质粒DNA损伤,损伤与NaDip浓度成正比,前提是添加的顺序为遵守试剂(pUC19质粒DNA + Cu ^ 2 ^ ++ NaDip)的反应介质中分别加入EDTA和新cuproine的Cu ^ 2 ^ +和Cu ^ +配体,促进了pUC19质粒DNA的完全抑制或还原。在相同的反应介质中添加过氧化氢酶(1.0x10^-^4mg@mL^-^1)后,pUC19质粒DNA损伤的减少,表明了Cu ^ 2 ^ + / Cu ^ +循环的参与。印指出H“ 2O” 2也参与了破坏过程。在NaDip浓度范围内(80-600 @ mM),并且在相同的实验条件下,无法推断是否存在10 @ mM Fe ^ 3 ^ +引起的pUC19质粒DNA损伤。在Mn ^ 3 ^ +或Ni ^ 2 ^ +的存在下未观察到破坏。尽管本研究中使用的技术对检测pUC19质粒DNA损伤很敏感,但无法确定这种损伤发生在哪个DNA碱基上。应使用其他技术做进一步研究,以明确鉴定造成DNA损伤的氧化性中间体。据我们所知,这是第一个研究在铜,铁,镍和锰离子存在下NaDip引起的pUC19质粒DNA损伤的研究。

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