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K-Λ crossover transition in the conduction band of monolayer MoS2 under hydrostatic pressure

机译:静水压力下单层MoS2导带中的K-Λ跃迁跃迁

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Monolayer MoS2 is a promising material for optoelectronics applications owing to its direct bandgap, enhanced Coulomb interaction, strong spin-orbit coupling, unique valley pseudospin degree of freedom, etc. It can also be implemented for novel spintronics and valleytronics devices at atomic scale. The band structure of monolayer MoS2 is well known to have a direct gap at K (K′) point, whereas the second lowest conduction band minimum is located at Λ point, which may interact with the valence band maximum at K point, to make an indirect optical bandgap transition. We experimentally demonstrate the direct-to-indirect bandgap transition by measuring the photoluminescence spectra of monolayer MoS2 under hydrostatic pressure at room temperature. With increasing pressure, the direct transition shifts at a rate of 49.4 meV/GPa, whereas the indirect transition shifts at a rate of ?15.3 meV/GPa. We experimentally extract the critical transition point at the pressure of 1.9 GPa, in agreement with first-principles calculations. Combining our experimental observation with first-principles calculations, we confirm that this transition is caused by the K-Λ crossover in the conduction band.
机译:单层MoS 2 由于其直接带隙,增强的库仑相互作用,强大的自旋轨道耦合,独特的谷假自旋自由度等而成为光电子应用的有前途的材料。它也可以用于新型自旋电子学以及原子级的Valleytronics设备。众所周知,单层MoS 2 的能带结构在K(K')点处具有直接间隙,而第二最低的导带最小位于Λ点,这可能与价带相互作用在K点处最大,以进行间接的光学带隙跃迁。通过在室温下在静水压力下测量单层MoS 2 的光致发光光谱,通过实验证明了直接到间接的带隙跃迁。随着压力的增加,直接跃迁以49.4meV / GPa的速率移动,而间接跃迁以〜15.3meV / GPa的速率移动。我们通过实验提取了在1.9 GPa压力下的临界转变点,与第一性原理计算一致。将我们的实验观察结果与第一性原理计算相结合,我们确认这种转变是由导带中的K-Λ交叉引起的。

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