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Design of four-layer tri-wavelength silica antireflective coatings with vector method containing absentee layer

机译:含缺席层的矢量法四层三波长二氧化硅减反射膜的设计

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A four-layer tri-wavelength silica antireflective (AR) coating with 100% transmittance simultaneously at 1064?nm, 532?nm and 355?nm was designed based on the vector method combined with absentee layer. The type of this AR coating is λ/2-λ/4-λ/2-λ/4 (λ0?=?532?nm): 1.0|L A1 H A2|1.46 with nL?=?1.19, nA1?=?1.31, nH?=?1.44 and nA2?=?1.33.
机译:基于矢量法和缺席层,设计了同时在1064?nm,532?nm和355?nm具有100%透射率的四层三波长二氧化硅减反射(AR)涂层。这种增透膜的类型是λ/2-λ/4-λ/2-λ/ 4(λ0θ=?532?nm):1.0 | L A1 H A2 | 1.46,nL?=?1.19,nA1?= α1.31,nHα= 1.44,nA2α= 1.33。

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