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首页> 外文期刊>International Journal of Modern Physics: Conference Series >THE OPTICAL AND ELECTRICAL PROPERTIES OF ZnO/Ag/ZnO FILMS ON FLEXIBLE SUBSTRATE
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THE OPTICAL AND ELECTRICAL PROPERTIES OF ZnO/Ag/ZnO FILMS ON FLEXIBLE SUBSTRATE

机译:ZnO / Ag / ZnO薄膜在柔性基板上的光学和电学性质

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The deposition of ZnO/Ag/ZnO film on polyethylene terephthalate (PET) substrate was fabricated by DC magnetron sputtering method. The thicknesses of ZnO layers were 30 nm and Ag films' thicknesses were changed from 1 nm to 6 nm by controlled the sputtering time. This kind of film can be used as transparent conductive oxide (TCO) materials. The electrical and optical properties of composite layers were determined by Ag films. The optimum sputtering time of Ag thin films was found to be 20 s for the high optical transmittance with good electrical conductivity. The ZnO/Ag(20 s)/ZnO layer, which has high optical transmittance of 73% at 550 nm, shows sheet resistance as low as 6.7 ohm/sq. These multilayer transparent films had low electrical resistance as the widely used transparent conductive oxide electrodes. SEM, XRD, the UV-Vis-NIR and Hall Effect measurement system were used to characterize properties of fabricated films. The reasons for the change of transmittance and resistance will also be interpreted.
机译:采用直流磁控溅射法在聚对苯二甲酸乙二醇酯(PET)基板上沉积ZnO / Ag / ZnO薄膜。通过控制溅射时间,ZnO层的厚度为30nm,Ag膜的厚度从1nm改变为6nm。这种膜可用作透明导电氧化物(TCO)材料。复合层的电学和光学性能由银膜确定。发现银薄膜的最佳溅射时间为20 s,以实现高透光率和良好的导电性。 ZnO / Ag(20 s)/ ZnO层在550 nm处具有73%的高透光率,其薄层电阻低至6.7 ohm / sq。这些多层透明膜作为广泛使用的透明导电氧化物电极具有低电阻。 SEM,XRD,UV-Vis-NIR和霍尔效应测量系统用于表征已加工薄膜的性能。还将解释透射率和电阻变化的原因。

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