High Temperature Oxidation Resistance and Electrical Properties of CrN/Cr Films Prepared by RF Magnetron Technology

摘要

In this work, CrN films were deposited on Si substrates with a Cr buffer layer (CrN/Cr films) by RF magnetron sputtering. The structure, surface morphology, chemical composition, high temperature oxidation resistance and resistivity were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray spectroscopy (EDX), X-ray photoelectron spectroscopy (XPS) and four-probe resist tester, respectively. The lattice constant of the CrN/Cr films with a (111) preferred orientation was estimated to be about 4.1336 ?. After high temperature heat treatment, the surface morphology of CrN/Cr films changed obviously, and the electrical properties of CrN/Cr films were improved. Our results can provide an important reference in the high temperature oxidation resistance research for CrN films.