Structural Analysis of RF Sputtered TiO2 Thin Film on Cu Substrate for Various Annealing Temperatures

Shanmugan S.; Mutharasu D.; Haslan A. H

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Structural Analysis of RF Sputtered TiO2 Thin Film on Cu Substrate for Various Annealing Temperatures

机译：不同退火温度下铜基板上射频溅射TiO2薄膜的结构分析

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The structural parameters of RF sputtered TiO2 thin film deposited on Cu substrates was tested using XRD spectra. Prepared TiO2 thin film was polycrystalline nature with the mixture of cubic, orthorhombic and tetragonal phases. Orthorhombic phase was pref

机译：用XRD光谱测试了沉积在Cu衬底上的RF溅射TiO2薄膜的结构参数。制备的TiO 2薄膜具有立方相，正交相和四方相的多晶性质。斜方相是优选的

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《International Journal of Engineering Trends and Technology》 |2014年第2期|共页
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Shanmugan S.; Mutharasu D.; Haslan A. H;
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Structural Analysis of RF Sputtered TiO2 Thin Film on Cu Substrate for Various Annealing Temperatures

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