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首页> 外文期刊>International Journal of Electrochemical Science >Corrosion Resistance of Passive Films on Orthodontic Bands in Fluoride-Containing Artificial Saliva
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Corrosion Resistance of Passive Films on Orthodontic Bands in Fluoride-Containing Artificial Saliva

机译:含氟人工唾液中正畸带上钝化膜的耐蚀性

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The purpose of this study was to evaluate the influence of fluoride ions on the corrosion behavior of orthodontic bands in artificial saliva. Thirty as–received orthodontic bands were divided into five groups randomly, and then immersed in fluoride-containing artificial saliva with different NaF concentrations (0wt.%, 0.1wt.%, 0.3wt.%, 0.5wt.% and 1wt.%) separately at 37℃ for 30 days. Potentiodynamic polarization, electrochemical impedance spectroscopy(EIS) and Mott-Schottky measurements were used to study the corrosion behaviour of orthodontic bands. Surface characterization was observed with scanning electron microscope (SEM) and energy dispersive X-ray spectrum (EDS). Statistical analysis was carried out using 1-way analysis of variance (ANOVA). The pitting corrosion could be observed on the orthodontic bands in fluoride-containing artificial saliva. With the increase of concentration of fluoride, corrosion current density increased, corrosion potiential, pitting potiential and the impedance of passive film decreased. Passive films of the bands formed at high concentrations of NaF had more disordered structures and higher defect densities. There were significant differences for pitting potential, corrosion current density, polarization resistance and carrier density of the experimental groups compared with control group (P<0.05). Fluorine ion participated in the development of pitting corrosion of orthodontic bands in artificial saliva. Severer corrosion occurred with the increase of concentration of fluoride. For more efficient treatment, the amount and the frequency of using fluorine-containing products should be considered in clinic.
机译:这项研究的目的是评估氟离子对人工唾液中正畸带腐蚀行为的影响。将30个接收到的正畸带随机分为5组,然后浸入具有不同NaF浓度(0wt。%,0.1wt。%,0.3wt。%,0.5wt。%和1wt。%)的含氟人工唾液中。分别在37℃下放置30天。电位动力极化,电化学阻抗谱(EIS)和Mott-Schottky测量用于研究正畸带的腐蚀行为。用扫描电子显微镜(SEM)和能量色散X射线光谱(EDS)观察表面表征。使用单向方差分析(ANOVA)进行统计分析。在含氟人造唾液的正畸带上可以观察到点蚀。随着氟化物浓度的增加,腐蚀电流密度增加,腐蚀电位,点蚀电位和钝化膜的阻抗降低。在高浓度的NaF下形成的带的无源膜具有更多的无序结构和更高的缺陷密度。实验组的点蚀电位,腐蚀电流密度,极化电阻和载流子密度与对照组相比差异有统计学意义(P <0.05)。氟离子参与了人工唾液中正畸带的点蚀的发展。随着氟化物浓度的增加,发生了严重的腐蚀。为了更有效的治疗,临床上应考虑使用含氟产品的数量和频率。

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