首页> 外文期刊>International Journal of Electrochemical Science >Inhibition Effect of Phthalocyaninatocopper(II) and 4- Tetranitro(phthalocyaninato)copper(II) Inhibitors for Protection of Aluminium in Acidic Media
【24h】

Inhibition Effect of Phthalocyaninatocopper(II) and 4- Tetranitro(phthalocyaninato)copper(II) Inhibitors for Protection of Aluminium in Acidic Media

机译:酞菁铜和2-四硝基硝基酞菁铜抑制剂在酸性介质中对铝的保护作用

获取原文
           

摘要

The inhibition effect of phthalocyaninatocopper(II) (CuPc) and 4-tetranitro(phthalocyaninato)copper(II)(TNCuPc) on aluminium in 1 mol/L HCl was investigated by electrochemical techniques. The CuPc andTNCuPc inhibitors were synthesized and confirmed by using X-ray diffraction (XRD), Fourier transforminfrared (FTIR), simultaneous thermal analysis (STA, thermogravimetric analysis (TGA)/differentialscanning calorimetry (DSC)) and ultraviolet-visible spectroscopy (UV-vis). The XRD, UV-vis and FTIRanalyses showed successful formation of CuPc and TNCuPc inhibitors. The thermal stability of CuPcincreased upon the introduction of NO2 group in the peripheral position as indicative of the formation ofTNCuPc. The potentiodynamic polarization (PDP) curves of aluminium in the corrosive environment ofHCl in the presence and absence of CuPc and TNCuPc compounds demonstrated that both cathodic andanodic processes of Al corrosion were suppressed. The Nyquist plots of electrochemical impedancespectroscopy (EIS) expressed mainly as a capacitive loop with different concentrations of CuPc andTNCuPc. The inhibition efficiency of these inhibitors increased with increase in inhibitor concentration,and their inhibition efficiencies in the same concentration decreased in the order of CuPc > TNCuPcaccording to PDP and EIS results due to a steric hindrance.
机译:通过电化学技术研究了酞菁铜(II)(CuPc)和4-四硝基(酞菁铜)铜(II)(TNCuPc)对铝在1 mol / L HCl中的抑制作用。通过使用X射线衍射(XRD),傅里叶变换红外(FTIR),同时热分析(STA,热重分析(TGA)/差示扫描量热法(DSC))和紫外可见光谱法(UV-可见)。 XRD,UV-vis和FTIR分析表明成功形成了CuPc和TNCuPc抑制剂。在周围位置引入NO 2基团后,CuPcin的热稳定性增加,表明形成了TNCuPc。在存在和不存在CuPc和TNCuPc化合物的情况下,在HCl腐蚀环境中铝的电位动力学极化(PDP)曲线表明,Al腐蚀的阴极和阳极过程均得到抑制。电化学阻抗谱(EIS)的奈奎斯特图主要表示为具有不同浓度的CuPc和TNCuPc的电容回路。这些抑制剂的抑制效率随着抑制剂浓度的增加而增加,而在相同浓度下,它们的抑制效率则由于空间位阻的影响而按照CuPc> TNCuP的顺序降低,这取决于PDP和EIS结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号