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首页> 外文期刊>International Journal of Advancements in Technology >Design of Low Threshold Voltage AlGaN/GaN High Electron Mobility Transistors for High Power Switching and Digital Logic Applications
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Design of Low Threshold Voltage AlGaN/GaN High Electron Mobility Transistors for High Power Switching and Digital Logic Applications

机译:用于大功率开关和数字逻辑应用的低阈值电压AlGaN / GaN高电子迁移率晶体管的设计

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摘要

AlGaN/GaN HEMTs has very high threshold voltage, which makes it un-suitable for power devices and digital logic applications. In this study a polarization model for graded channel AlGaN in AlGaN/GaN high electron mobility transistors (HEMTs) has been developed by dividing the graded region into small numbers of elements, of constant Aluminum compositions. The proposed model is further extended to find an expression of total charge density due to non-vanishing polarization charge inside the graded region. A 3 dimensional electron gas (3DEG) is obtained in graded AlGaN/GaN HEMT structures. Predicted threshold voltage for graded HEMTs is lower than in conventional HEMTs. Threshold voltage of the graded device can further be tailored by using different Al composition in graded region. Maximum channel current in graded HEMT device is lower than conventional HEMT. However, with grading in AlGaN, one can grow with higher Al composition in AlGaN layer and can enhance the performance of graded AlGaN/GaN HEMT.
机译:AlGaN / GaN HEMT具有很高的阈值电压,因此不适合功率器件和数字逻辑应用。在这项研究中,已经通过将渐变区域划分为少量元素(具有恒定的铝成分),开发了AlGaN / GaN高电子迁移率晶体管(HEMT)中渐变沟道AlGaN的极化模型。进一步扩展了提出的模型,以找到由于渐变区域内不消失的极化电荷而引起的总电荷密度的表达式。在渐变的AlGaN / GaN HEMT结构中获得了三维电子气(3DEG)。分级HEMT的预测阈值电压低于传统HEMT。可以通过在渐变区域中使用不同的Al成分来定制渐变设备的阈值电压。分级HEMT设备中的最大通道电流低于常规HEMT。然而,随着AlGaN中的渐变,可以在AlGaN层中以更高的Al组成生长并且可以增强渐变的AlGaN / GaN HEMT的性能。

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