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首页> 外文期刊>Indian Journal of Pure & Applied Physics >Effect of substrate temperatures, deposition rate and heat treatment on structural and carrier transport mechanisms of thermal evaporated p-Cu?S-CdS heterojunction
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Effect of substrate temperatures, deposition rate and heat treatment on structural and carrier transport mechanisms of thermal evaporated p-Cu?S-CdS heterojunction

机译:衬底温度,沉积速率和热处理对热蒸发p-Cu?S / n-CdS异质结的结构和载流子传输机理的影响

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The p-Cu?S-CdS heterojunction (Hj) has been fabricated by vacuum deposition of p-Cu?S thin film onto n-CdS thin film. CdS layer was evaporated at substrate temperature, Ts ? 473 K and rate of deposition ?0.06 ?m/min. The dark-temperature-current density-voltage (J-V-T) and illumination characteristics were measured over a reasonable temperature range (303-423K). The conduction mechanism was suggested to be thermo ionic for forward applied voltage < 0.2V. For higher voltage, the space charge limited current was the predominant mechanism. In the reverse direction, the generation and recombination mechanisms were the operating mechanisms. Finally, the photovoltaic characteristics and the spectral response of p-Cu?S-CdS were also studied.
机译:p-Cu 2 S / n-CdS异质结(Hj)是通过将p-Cu 2 S薄膜真空沉积到n-CdS薄膜上而制成的。 CdS层在衬底温度Ts≥1时蒸发。 473 K,沉积速率约为0.06μm/ min。在合理的温度范围内(303-423K)测量了暗温度-电流密度-电压(J-V-T)和照明特性。对于正向施加的电压<0.2V,建议其传导机理为热离子。对于更高的电压,空间电荷限制电流是主要机制。相反,产生和重组机制是操作机制。最后,还研究了p-Cu 2 S / n-CdS的光电特性和光谱响应。

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