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Evaluation of the effect of different methods of microabrasion and polishing on surface roughness of dental enamel

机译:评价不同的微磨蚀和抛光方法对牙釉质表面粗糙度的影响

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Description of the Technique: The microabrasion technique of enamel consists of selectively abrading the discolored areas or causing superficial structural changes in a selective way. Objective: In microabrasion technique, abrasive products associated with acids are used, and the evaluation of enamel roughness after this treatment, as well as surface polishing, is necessary. This in-vitro study evaluated the enamel roughness after microabrasion, followed by different polishing techniques. Settings and Design: Roughness analyses were performed before microabrasion (L1), after microabrasion (L2), and after polishing (L3).Thus, 60 bovine incisive teeth divided into two groups were selected (n=30): G1- 37% phosphoric acid (37%) (Dentsply) and pumice; G2- hydrochloric acid (6.6%) associated with silicon carbide (Opalustre - Ultradent). Thereafter, the groups were divided into three sub-groups (n=10), according to the system of polishing: A - Fine and superfine granulation aluminum oxide discs (SofLex 3M); B - Diamond Paste (FGM) associated with felt discs (FGM); C - Silicone tips (Enhance - Dentsply). A PROC MIXED procedure was applied after data exploratory analysis, as well as the Tukey-Kramer test (5%). Results: No statistical differences were found between G1 and G2 groups. L2 differed statistically from L1 and showed superior amounts of roughness. Differences in the amounts of post-polishing roughness for specific groups (1A, 2B, and 1C) arose, which demonstrated less roughness in L3 and differed statistically from L2 in the polishing system. Conclusion: All products increased enamel roughness, and the effectiveness of the polishing systems was dependent upon the abrasive used.
机译:技术描述:搪瓷的微磨蚀技术包括选择性地磨蚀变色区域或引起表面结构变化。目的:在微研磨技术中,使用与酸有关的研磨产品,并且必须评估该处理后的瓷釉粗糙度以及表面抛光。这项体外研究评估了微磨蚀后的牙釉质粗糙度,然后采用了不同的抛光技术。设置与设计:在进行微磨之前(L1),微磨之后(L2)和抛光(L3)进行粗糙度分析,因此,选择了60头牛切牙分为两组(n = 30):G1- 37%磷酸(37%)(牙粉)和浮石;与碳化硅(Opalustre-Ultradent)缔合的G2-盐酸(6.6%)。此后,根据抛光系统将各组分为三个子组(n = 10):A-细颗粒和超细颗粒氧化铝盘(SofLex 3M); B-与毡盘(FGM)相关的钻石膏(FGM); C-硅胶笔尖(增强-登士普)。在数据探索性分析以及Tukey-Kramer测试(5%)之后,应用PROC MIXED程序。结果:G1和G2组之间没有统计学差异。 L2在统计上与L1不同,并且显示出较高的粗糙度。出现了特定组(1A,2B和1C)的抛光后粗糙度量的差异,这表明L3的粗糙度较小,并且在抛光系统中与L2具有统计学差异。结论:所有产品均会增加瓷釉的粗糙度,并且抛光系统的有效性取决于所使用的磨料。

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