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Structural, opto-electronic and photoelectrochemical properties of tungsten diselenide thin films

机译:二硒化钨薄膜的结构,光电和光电化学性能

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摘要

Nanocrystalline tungsten diselenide thin films have been deposited on non-conducting glass and stainless steel substrates by chemical methods. Various preparative conditions were optimized for the formation of thin films. The X-ray diffraction analysis shows that the film samples are in layer-hexagonal crystal structure. EDAX analysis shows that the films are nearly stoichiometries of W:Se. Optical properties show a direct band gap nature with band gap energy 1.5?eV. Specific electrical conductivity was found to be in the order of 10?3 to 10?2 (Ω?cm)?1. The photoelectrochemical characterization of the films was carried out by studying current–voltage characteristics, capacitance–voltage and power output characteristics. The efficiency of photoelectrode was found to be 1.31?% using iodine–poly iodide electrolyte.
机译:纳米晶二硒化钨薄膜已通过化学方法沉积在非导电玻璃和不锈钢基板上。优化了各种制备条件以形成薄膜。 X射线衍射分析表明,薄膜样品为层六方晶体结构。 EDAX分析表明该膜几乎是W:Se的化学计量。光学性质显示出带隙能为1.5?eV的直接带隙性质。发现比电导率为10 ?3 到10 ?2 (Ω?cm)?1 。通过研究电流-电压特性,电容-电压和功率输出特性对薄膜进行光电化学表征。使用碘-聚碘化物电解质发现光电极的效率为1.31%。

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