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首页> 外文期刊>American Journal of Chemical Engineering >The Study to Investigate Growth Rate of Metal Nanowires into Anodic Alumina Oxide Arrays via Electrodeposition
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The Study to Investigate Growth Rate of Metal Nanowires into Anodic Alumina Oxide Arrays via Electrodeposition

机译:通过电沉积法研究金属纳米线在阳极氧化铝阵列中的生长速率的研究

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To understand the growth mechanism of electrodeposited Fe, Ni and Co, we have studied the effect of workfunction on the metal nanowire growth by SEM and Potentiostat. We found that the current density for deposition of Fe nanowires is higher than of Ni and Co nanowires under the same fixed potential, overpotential, pH, concentration of metal ions and temperature. Using the electrons tunneling theory, we have argued that the current density of the metals depends on the workfunction and width of double layer. The current density increases with decreasing the length of double layer. The current density of metal with a smaller workfunction can be higher than that of metal with a larger workfunction.
机译:为了了解电沉积的Fe,Ni和Co的生长机理,我们通过SEM和恒电位仪研究了功函数对金属纳米线生长的影响。我们发现,在相同的固定电势,超电势,pH,金属离子浓度和温度下,用于沉积Fe纳米线的电流密度高于Ni和Co纳米线。使用电子隧穿理论,我们认为金属的电流密度取决于双层的功函数和宽度。电流密度随着双层长度的减小而增加。具有较小功函数的金属的电流密度可以高于具有较大功函数的金属的电流密度。

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