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Investigate the complex process in particle-fluid based surface generation technology using reactive molecular dynamics method

机译:使用反应分子动力学方法研究基于粒子流体的表面生成技术中的复杂过程

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Particle-fluid based surface generation process has already become one of the most important materials processing technology for many advanced materials such as optical crystal, ceramics and so on. Most of the particle-fluid based surface generation technology involves two key process: chemical reaction which is responsible for surface softening; physical behavior which is responsible for materials removal/deformation. Presently, researchers cannot give a reasonable explanation about the complex process in the particle-fluid based surface generation technology because of the small temporal-spatial scale and the concurrent influence of physical-chemical process. Molecular dynamics (MD) method has already been proved to be a promising approach for constructing effective model of atomic scale phenomenon and can serve as a predicting simulation tool in analyzing the complex surface generation mechanism and is employed in this research to study the essence of surface generation. The deformation and piles of water molecule is induced with the feeding of abrasive particle which justifies the property mutation of water at nanometer scale. There are little silica molecule aggregation or materials removal because the water-layer greatly reduce the strength of mechanical interaction between particle and materials surface and minimize the stress concentration. Furthermore, chemical effect is also observed at the interface: stable chemical bond is generated between water and silica which lead to the formation of silconl and the reaction rate changes with the amount of water molecules in the local environment. Novel ring structure is observed in the silica surface and it is justified to be favored of chemical reaction with water molecule. The siloxane bond formation process quickly strengthened across the interface with the feeding of abrasive particle because of the compressive stress resulted by the impacting behavior.
机译:基于颗粒流体的表面生成工艺已经成为许多先进材料(如光学晶体,陶瓷等)最重要的材料加工技术之一。大多数基于粒子流体的表面生成技术都涉及两个关键过程:负责表面软化的化学反应;造成材料去除/变形的物理行为。目前,由于时空尺度小以及物理化学过程的共同影响,研究人员无法对基于粒子流体的表面生成技术中的复杂过程给出合理的解释。分子动力学(MD)方法已被证明是构建有效的原子尺度现象模型的有前途的方法,可作为分析复杂表面生成机理的预测仿真工具,并用于研究表面的本质代。水分子的变形和堆积是由磨料颗粒的进料引起的,这证明了水在纳米尺度上的性质突变是合理的。由于水层大大降低了颗粒与材料表面之间的机械相互作用强度并使应力集中最小化,因此几乎没有二氧化硅分子聚集或去除材料。此外,在界面处还观察到化学作用:水与二氧化硅之间产生稳定的化学键,导致硅酮的形成,反应速率随局部环境中水分子的数量而变化。在二氧化硅表面观察到新颖的环结构,并证明其有利于与水分子发生化学反应。硅氧烷键的形成过程在整个界面上随着磨料的进料而迅速增强,这是由于冲击行为导致的压应力。

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