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Dependence of optimal spacing on applied field in ungated field emitter arrays

机译:无间距场发射器阵列中最佳间距对施加场的依赖性

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摘要

In ungated field emitter arrays, the field enhancement factor β of each emitter tip is reduced below the value it would have in isolation due to the presence of adjacent emitters, an effect known as shielding or screening. Reducing the distance b between emitters increases the density of emission sites, but also reduces the emission per site, leading to the existence of an optimal spacing that maximizes the array current. Most researchers have identified that this optimal spacing is comparable to the emitter height h, although there is disagreement about the exact optimization. Here, we develop a procedure to determine the dependence of this optimal spacing on the applied electric field. It is shown that the nature of this dependence is governed by the shape of the β(b) curve, and that for typical curves, the optimal value of the emitter spacing b decreases as the applied field increases.
机译:在非门控场发射器阵列中,由于相邻发射器的存在,每个发射器尖端的场增强因子β降低到其隔离值以下,这种效应称为屏蔽或屏蔽。减小发射极之间的距离b会增加发射位点的密度,但也会减少每个位点的发射量,从而导致存在使阵列电流最大化的最佳间距。大多数研究人员已经确定,尽管在精确优化上存在分歧,但该最佳间距可与发射器高度h相媲美。在这里,我们开发了一种确定此最佳间距对所施加电场的依赖性的过程。结果表明,这种依赖关系的性质由β(b)曲线的形状决定,对于典型曲线,发射极间距b的最佳值随着施加场的增加而减小。

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