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Theoretical investigation of a low-voltage Ge/SiGe multiple quantum wells optical modulator operating at 1310 nm integrated with Si3N4 waveguides

机译:与Si3N4波导集成的工作在1310 nm的低压Ge / SiGe多量子阱光调制器的理论研究

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We report on the design and simulation using 3D-FDTD simulation of Si3N4-integrated Ge/SiGe multiple quantum wells (MQWs) optical modulators at the optical wavelength of 1310 nm. The effect of fabrication tolerance and wavelength dependence on the optical coupling performance between the Si3N4 waveguide and the Ge/SiGe MQWs structure as well as the optical modulation performance are reported. The results show that Si3N4-waveguide-integrated Ge/SiGe MQWs optical modulators can attain several key performance requirements in terms of extinction ratio, insertion loss, driving voltage, and fabrication variations with a compact footprint favorable for short-range optical interconnect applications.
机译:我们报告了在1310的光波长下使用Si 3 N 4 集成的Ge / SiGe多量子阱(MQWs)光调制器的3D-FDTD模拟设计和模拟纳米报道了制造公差和波长依赖性对Si 3 N 4 波导与Ge / SiGe MQWs结构之间的光耦合性能的影响以及光调制性能。 。结果表明,集成了Si 3 N 4 波导的Ge / SiGe MQWs光调制器在消光比,插入损耗,驱动电压,紧凑的封装和适合于短距离光学互连应用的制造变化。

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