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Molecular dynamics simulations of ejecta production from sinusoidal tin surfaces under supported and unsupported shocks

机译:支撑和非支撑冲击下从正弦锡表面产生弹射的分子动力学模拟

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Micro-ejecta, an instability growth process, occurs at metal/vacuum or metal/gas interface when compressed shock wave releases from the free surface that contains surface defects. We present molecular dynamics (MD) simulations to investigate the ejecta production from tin surface shocked by supported and unsupported waves with pressures ranging from 8.5 to 60.8 GPa. It is found that the loading waveforms have little effect on spike velocity while remarkably affect the bubble velocity. The bubble velocity of unsupported shock loading remains nonzero constant value at late time as observed in experiments. Besides, the time evolution of ejected mass in the simulations is compared with the recently developed ejecta source model, indicating the suppressed ejection of unmelted or partial melted materials. Moreover, different reference positions are chosen to characterize the amount of ejecta under different loading waveforms. Compared with supported shock case, the ejected mass of unsupported shock case saturates at lower pressure. Through the analysis on unloading path, we find that the temperature of tin sample increases quickly from tensile stress state to zero pressure state, resulting in the melting of bulk tin under decaying shock. Thus, the unsupported wave loading exhibits a lower threshold pressure causing the solid-liquid phase transition on shock release than the supported shock loading.
机译:当从包含表面缺陷的自由表面释放压缩冲击波时,微喷射是一种不稳定的生长过程,发生在金属/真空或金属/气体界面。我们提出了分子动力学(MD)模拟,以研究在压力为8.5至60.8 GPa的情况下,受支撑和不支撑的波冲击后,锡表面产生的喷射现象。发现加载波形对峰值速度几乎没有影响,而对气泡速度有显着影响。在实验中观察到的无支撑冲击载荷的气泡速度在后期仍保持非零恒定值。此外,在仿真中将喷射质量随时间的变化与最近开发的喷射源模型进行了比较,表明未熔化或部分熔化的材料的喷射受到抑制。而且,选择不同的参考位置以表征在不同加载波形下的喷射量。与支撑的防震盒相比,无支撑的防震盒的顶出质量在较低的压力下会饱和。通过对卸荷路径的分析,我们发现锡样品的温度从拉应力状态迅速上升到零压力状态,导致块状锡在衰减冲击下熔化。因此,无支撑的波浪载荷表现出比支撑的冲击载荷更低的阈值压力,该阈值压力在冲击释放时引起固-液相转变。

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