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The Impact of Non-Uniform Heat Source/Sink on Chemically Reacting MHD Flow Over An Expanding Sheet

机译:非均匀热源/散热器对扩展板上的化学反应MHD流动的影响

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The impact of uneven heat source/sink on the magnetohydrodynamic liquid film flow of Casson fluid in the presence of chemical reaction is investigated theoretically. The transformed governing boundary layer equations are solved numerically by adopting the bvp4c Matlab package. The impact of pertinent parameters, namely, Casson parameter, non-uniform heat source/sink parameters, chemical reaction parameter, magnetic field parameter, unsteadiness parameter and film thickness parameter on the flow, thermal and concentration fields are discussed with the help of graphs. Numerical illustrations of local Nusselt and Sherwood numbers are presented and discussed with the help of tables.
机译:从理论上研究了不均匀的热源/汇对卡森流体的磁流体动力学液膜流动的影响。通过采用bvp4c Matlab软件包,对变换后的控制边界层方程进行了数值求解。借助图形讨论了相关参数,即卡森参数,不均匀的热源/散热器参数,化学反应参数,磁场参数,不稳定参数和膜厚参数对流场,热场和浓度场的影响。在表格的帮助下显示和讨论了本地Nusselt和Sherwood数的数字图示。

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