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A Review of Semiconductor Quantum Well Devices

机译:半导体量子阱器件综述

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Quantum well devices feature very thin epitaxial layers of heterostructure III-V and II-VI semiconductor materials that are grown using Molecular Beam Epitaxy (MBE) and Metal-Organic Chemical Vapour Deposition (MOCVD) growth techniques. These devices are monolithically integrated with various optoelectronic devices to provide photonic integrated circuit with increased functionality .The quantum well structure can be realized with GaAs as wells and AlGaAs as barriers for wavelength about 0.8 μm and InGaAsP/InP offering longer wavelengths (0.9-1.6 μm). Quantum well devices find their applications in quantum well lasers or improved lasers, photodetectors, modulators and switches. These devices operate much faster, more economically and have led to a million increases in speed, a point of enormous importance to the telecommunication and computer industry.
机译:量子阱器件的特征是采用分子束外延(MBE)和金属有机化学气相沉积(MOCVD)生长技术生长的异质结构III-V和II-VI半导体材料的非常薄的外延层。这些器件与各种光电器件进行单片集成,以提供具有增强功能的光子集成电路。量子阱结构可以用GaAs阱和AlGaAs作为波长约0.8μm的势垒,而InGaAsP / InP提供更长的波长(0.9-1.6μm)来实现)。量子阱设备可用于量子阱激光器或改进型激光器,光电探测器,调制器和开关。这些设备的运行速度更快,更经济,并且导致速度提高了100万,这对电信和计算机行业至关重要。

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