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Growth of Ga-doped ZnO films by thermal oxidation with gallium and their optical properties

机译:镓热氧化镓掺杂ZnO薄膜的生长及其光学性质

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Metal gallium was evaporated onto ZnS films by physical vapor deposition method and then the thermal oxidation in the air was subsequently performed for the growth of Ga-doped ZnO films. The microstructures, photoluminescence (PL) and optical absorption properties of the Ga-doped ZnO films prepared under different deposition and oxidation conditions were investigated. The results showed that certain Ga doping can decrease the defects level, improve the crystallinity of ZnO films, and it became more effective with the extension of oxidation time. As the oxidation time increased, the Ga-doped ZnO films became more compact and uniform, displaying higher crystallinity. In addition, the optical band gaps of the ZnO films increased, the PL intensity of the visible emission decreased, and the luminescent center of the visible emission changed. Among them, the 505 nm emission resulted from oxygen vacancy, while the 539 nm emission was associated with oxygen interstitial.
机译:通过物理气相沉积法将金属镓蒸发到ZnS薄膜上,然后在空气中进行热氧化,以生长掺Ga的ZnO薄膜。研究了在不同沉积和氧化条件下制备的Ga掺杂ZnO薄膜的微观结构,光致发光(PL)和光吸收性能。结果表明,一定的Ga掺杂可以降低缺陷水平,提高ZnO薄膜的结晶度,并随着氧化时间的延长而变得更加有效。随着氧化时间的增加,掺杂Ga的ZnO薄膜变得更致密和均匀,显示出更高的结晶度。另外,ZnO膜的光学带隙增加,可见光发射的PL强度降低,并且可见光发射的发光中心改变。其中,505 nm的发射是由于氧的空位引起的,而539 nm的发射与氧的间隙有关。

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