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Changes in electrical and optical properties of polycrystalline Ga-doped ZnO thin films due to thermal desorption of zinc

机译:锌的热脱附导致多晶掺杂Ga的ZnO薄膜电学和光学性质的变化

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摘要

Influences of thermal desorption of Zn atoms on electrical and optical properties of Ga-doped ZnO (GZO) films deposited by ion plating with direct current arc discharge have been studied. The amount of Zn desorption was controlled by thermal desorption spectroscopy. The resistivity of the GZO films was not affected by the thermal desorption of Zn up to the heating temperature of 300 ℃, however, the carrier concentration and the Hall mobility showed remarkable changes. The carrier concentrations decreased with increasing the Zn desorption, and the Hall mobility increased. The decrease in carrier concentration showed strong correlation with the desorption of Zn atoms from the GZO films. The transparency in near infrared wavelength region increased without change of resistivity due to the decrease in carrier concentration.
机译:研究了锌原子的热脱附对通过直流电弧放电离子镀沉积的掺杂Ga的ZnO(GZO)薄膜的电学和光学性能的影响。 Zn的解吸量通过热解吸光谱法控制。 GZO薄膜的电阻率不受Zn在300℃加热温度下的热脱附的影响,但是,载流子浓度和霍尔迁移率显示出显着变化。载流子浓度随着锌解吸量的增加而降低,霍尔迁移率增加。载流子浓度的降低与Zn原子从GZO膜中的解吸显示出强烈的相关性。由于载流子浓度的降低,近红外波长区域的透明度增加而电阻率不变。

著录项

  • 来源
    《Thin Solid Films》 |2011年第5期|p.1407-1410|共4页
  • 作者单位

    Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;

    Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;

    Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;

    Materials Design Center, Research Institute, Kochi University of Technology, 185 Miyanokuchi, Tosayamada-cho, Kami, Kochi 782-8502, Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ZnO; Ga; GZO; transparent conductive oxide; thermal desorption;

    机译:氧化锌;GZO;透明导电氧化物;热脱附;

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