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Vacuum-Level Shift at Al/LiF/Alq3 Interfaces: A First-Principles Study

机译:Al / LiF / Alq3界面上的真空能级转换:第一性原理研究

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Work function changes, or vacuum-level shifts (ΔVLS), in Al(001) surfaces by the adsorption of thin layers composed of tris(8-hydroxyquinolinato)aluminum (Alq3) and/or LiF are theoretically investigated. First-principles calculations reasonably reproduce experimentally obtained ΔVLS values, enabling us to discuss the underlying mechanism. Dipole moment of Alq3 and interfacial charge rearrangement (Pauli push-back effect) are the main reasons for ΔVLS at Al(001)–Alq3 and Al(001)–LiF interfaces, respectively. For a stacked Al(001)–LiF–Alq3 layer configuration, theory suggests a more complicated picture, which takes charge rearrangement between LiF and Alq3 layers into account, than a simple sum rule of dipole contributions from the two layers.
机译:理论上研究了由三(8-羟基喹啉基)铝(Alq3)和/或LiF构成的薄层的吸附作用,在Al(001)表面的功函数变化或真空能级位移(ΔVLS)。第一性原理计算合理地再现了实验获得的ΔVLS值,使我们能够讨论其潜在机理。 Alq3的偶极矩和界面电荷重排(保利推回效应)是分别在Al(001)-Alq3和Al(001)-LiF界面处产生ΔVLS的主要原因。对于堆叠的Al(001)-LiF-Alq3层配置,理论认为,与简单的两层偶极贡献和规则相比,该图考虑了LiF和Alq3层之间的电荷重排。

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