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首页> 外文期刊>ACS Omega >Characterization and Validation of a-Si Magnetron-Sputtered Thin Films as Solid He Targets with High Stability for Nuclear Reactions
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Characterization and Validation of a-Si Magnetron-Sputtered Thin Films as Solid He Targets with High Stability for Nuclear Reactions

机译:a-Si磁控溅射薄膜作为固体He目标的核反应高稳定性的表征和验证

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In this work, we present our magnetron sputtering based methodology to produce amorphous silicon coatings with closed porosity, as a strategy to fabricate solid helium targets, in the form of supported or self-supported thin films, for nuclear reactions. We show how by changing the He working pressure it is possible to obtain highly porous homogeneous structures incorporating different He amounts. These porous coatings (a-Si:He) are very reproducible from run to run, and the high He amount incorporated makes them excellent candidates for solid He targets. The possibility of producing self-supported films is illustrated here, and its potential use in inverse kinematics experiments with radioactive beams is shown through the dispersion in forward geometry of a stable ~(6)Li beam. Also the elastic scattering cross-sections for proton from helium were determined using an a-Si:He coating. The results agree well with the ones reported in the literature. These two examples validate our coatings as good candidates to be used as solid He targets in nuclear reactions. The stability of He inside the coatings, fundamental for its use as solid He targets, was investigated, both over time and after irradiation. The coatings proved to be very stable, and the amount of He inside the pores remains unaltered at least 2 years after deposition and after high irradiation fluence (5 × 10~(17) particles/cm~(2); with a dose rate of 5 × 10~(12) particles/(cm~(2) s)).
机译:在这项工作中,我们提出了一种基于磁控溅射的方法来生产具有闭合孔隙率的非晶硅涂层,以此作为制造用于核反应的支撑或自支撑薄膜形式的固体氦靶的策略。我们展示了如何通过改变He的工作压力来获得掺有不同He量的高度多孔的均质结构。这些多孔涂层(a-Si:He)每次运行都具有很高的重现性,而且掺入的高He量使其成为固体He目标的极佳候选材料。此处说明了产生自支撑膜的可能性,并通过稳定的〜(6)Li射束在正向几何形状中的分散显示了其在放射性束逆运动学实验中的潜在用途。还使用a-Si:He涂层确定了氦气质子的弹性散射截面。结果与文献报道相吻合。这两个例子证明了我们的涂层是在核反应中用作固体He靶的良好候选者。研究了涂层内部氦气的稳定性,这是用作固体氦靶的基础,它随时间推移和经过辐照后都处于稳定状态。事实证明,该涂层非常稳定,在沉积后至少2年和在高辐照通量后(5×10〜(17)粒子/ cm〜(2);剂量率为),孔内的He量保持不变。 5×10〜(12)个粒子/(cm〜(2)s))。

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