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Characterization and Validation of a-Si Magnetron-SputteredThin Films as Solid He Targets with High Stability for Nuclear Reactions

机译:非晶硅磁控溅射的表征与验证固态氦靶薄膜对核反应具有高稳定性

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摘要

In this work, we present our magnetron sputtering based methodology to produce amorphous silicon coatings with closed porosity, as a strategy to fabricate solid helium targets, in the form of supported or self-supported thin films, for nuclear reactions. We show how by changing the He working pressure it is possible to obtain highly porous homogeneous structures incorporating different He amounts. These porous coatings (a-Si:He) are very reproducible from run to run, and the high He amount incorporated makes them excellent candidates for solid He targets. The possibility of producing self-supported films is illustrated here, and its potential use in inverse kinematics experiments with radioactive beams is shown through the dispersion in forward geometry of a stable 6Li beam. Also the elastic scattering cross-sections for proton from helium were determined using an a-Si:He coating. The results agree well with the ones reported in the literature. These two examples validate our coatings as good candidates to be used as solid He targets in nuclear reactions. The stability of He inside the coatings, fundamental for its use as solid He targets, was investigated, both over timeand after irradiation. The coatings proved to be very stable, andthe amount of He inside the pores remains unaltered at least 2 yearsafter deposition and after high irradiation fluence (5 × 1017 particles/cm2; with a dose rate of 5 × 1012 particles/(cm2 s)).
机译:在这项工作中,我们提出了一种基于磁控溅射的方法来生产具有闭合孔隙率的非晶硅涂层,以此作为制备用于核反应的支撑或自支撑薄膜形式的固体氦靶的策略。我们展示了如何通过改变He的工作压力来获得结合不同He量的高度多孔的均质结构。这些多孔涂层(a-Si:He)每次运行都具有很高的重现性,并且掺入的高He量使其成为固体He目标的极佳候选者。此处说明了生产自支撑膜的可能性,并通过稳定的 6 Li射束在正向几何形状中的分散显示了其在放射性束逆运动学实验中的潜在用途。还使用a-Si:He涂层确定了氦气质子的弹性散射截面。结果与文献报道相吻合。这两个例子证明我们的涂层是在核反应中用作固体He目标的良好候选者。随时间推移,研究了氦在涂层内部的稳定性,这是用作固体氦靶的基础,照射后事实证明该涂层非常稳定,并且至少两年内毛孔内的He量保持不变沉积后和高辐射通量后(5×10 17 颗粒/ cm 2 ;剂量率为5×10 12 颗粒/( cm 2 s))。

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