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Synthesis and Evaluation of the Semiconductor Behavior in Vanadium Indanone Derivatives Thin Films

机译:钒茚满酮衍生物薄膜的半导体性能合成与评价

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In this work, we propose a method to synthesize vanadium (IV) 2-benzyli-dene-1-indanone derivatives, used to prepare film structures by thermal evaporation. The complexes possess high melting point allowing the using of vacuum deposition methods. All the samples were grown at room temperature (25℃) and low deposition rates (0.4 ?/s). The surface morphology and structure of the deposited films were studied by scanning electron microscopy (SEM) and spectroscopy dispersive energy (EDS). Optical absorption studies of the complex films were performed in the 200 - 1100 nm wavelength range. The Tauc band gap (Eg) of the thin films was determined from the (αhν)1/2 vs. hν plots for indirect transitions. The vanadium (IV) complex films show optical activation energies in the range of organic semiconductors. Multilayer nylon 11/vanadium indanone devices were fabricated using ITO and silver electrodes. The d.c. electrical properties of the device were also investigated. It was found that the temperature-dependent electric current in the structure showed a semiconductor behavior. At lower voltages below 7 V, the current density in the forward direction was found to obey an ohmic I-V relationship; for higher voltages above 7 V, the conduction was dominated by a space-charge-limited (SCLC) mechanism. The electrical activation energies (Ea) of the complexes were in the 2.17 - 2.31 eV range.
机译:在这项工作中,我们提出了一种合成钒(IV)2-苄基-二烯-1-茚满酮衍生物的方法,该衍生物用于通过热蒸发制备薄膜结构。该配合物具有高熔点,允许使用真空沉积方法。所有样品均在室温(25℃)和低沉积速率(0.4?/ s)下生长。通过扫描电子显微镜(SEM)和光谱色散能(EDS)研究了沉积膜的表面形态和结构。复合膜的光吸收研究是在200-1100 nm波长范围内进行的。薄膜的Tauc带隙(Eg)是根据(αhν)1/2与hν曲线进行间接跃迁确定的。钒(IV)复合膜在有机半导体范围内显示出光活化能。使用ITO和银电极制造了多层尼龙11 /钒茚满酮器件。直流电还研究了器件的电性能。发现该结构中的温度相关电流显示出半导体行为。在低于7 V的较低电压下,发现正向电流密度符合I-V欧姆关系;对于高于7 V的更高电压,传导受空间电荷限制(SCLC)机制支配。配合物的电活化能(Ea)在2.17-2.31 eV范围内。

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