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Low-temperature plasma applications in chemical fungicide treatment reduction

机译:低温等离子体在化学杀菌剂处理中的应用

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In order to reduce the environmental burden of chemicals, various new alternatives to seed protection are being sought. Our aim was to find an environmentally acceptable solution leading to the inactivation of seed-borne phytopathogenic fungi Fusarium culmorum on the surface of wheat and barley seeds with a positive effect on their germination. As a low-temperature plasma (LTP) source, a Diffuse Coplanar Surface Barrier Discharge (DCSBD) was used. Plasma generated by DCSBD is non-equilibrium, cold, diffuse, macroscopically homogeneous even in ambient air at atmospheric pressure. Experimental results showed that LTP treatment in the range of 120—300 s significantly inhibits the growth of F. culmorum on the surface of the seeds. The efficiency of LTP treatment was compared with traditional seed protection processes using chemical fungicide and also with combined seed pretreatment by plasma and subsequent application of chemical fungicide. No growth of F. culmorum was observed after the combination of Vitavax 2000 fungicide application in the dose of 10 % and 60 s of LTP treatment even on the 5th day of incubation. Better wettability of seeds with the chemical fungicide was related to the change on seed surface, which becomes hydrophilic after 10 s of LTP application. Short LTP exposure times did not affect germination and improved the growth parameter of cereal seeds. By combining physical (LTP) and chemical (Vitavax 2000) treatments of cereal seeds, it is possible to effectively reduce the required amount of chemical fungicide and to stimulate germination and early growth seed parameters.
机译:为了减轻化学品的环境负担,正在寻求各种新的种子保护替代方法。我们的目标是找到一种环境可接受的解决方案,以使小麦和大麦种子表面上的种子传播的植物致病真菌镰刀菌灭活,并对其发芽产生积极影响。作为低温等离子体(LTP)源,使用了扩散共面表面势垒放电(DCSBD)。即使在大气压下的环境空气中,DCSBD产生的等离子体也是不平衡的,冷的,扩散的,宏观上均匀的。实验结果表明,LTP处理在120-300 s范围内可显着抑制暗角镰刀菌在种子表面的生长。将LTP处理的效率与使用化学杀真菌剂的传统种子保护工艺进行了比较,还与通过等离子体联合化学预处理种子以及随后施用化学杀真菌剂进行了比较。在10%的剂量和60 s的LTP处理剂量的Vitavax 2000杀真菌剂组合使用后,即使在培养的第5天,也没有观察到F. culmorum的生长。化学杀真菌剂对种子更好的润湿性与种子表面的变化有关,该变化在LTP施用10 s后变为亲水性。短时间的LTP暴露时间不影响发芽,并改善了谷物种子的生长参数。通过对谷物种子进行物理处理(LTP)和化学处理(Vitavax 2000),可以有效减少化学杀真菌剂的用量,并刺激种子萌发和种子的早期生长。

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