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首页> 外文期刊>Coatings >Structural Study of Silica Coating Thin Layers Prepared from Perhydropolysilazane: Substrate Dependence and Water Penetration Structure
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Structural Study of Silica Coating Thin Layers Prepared from Perhydropolysilazane: Substrate Dependence and Water Penetration Structure

机译:由全氢聚硅氮烷制备的二氧化硅涂层薄层的结构研究:基质依赖性和透水结构

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摘要

The structure of perhydropolysilazane (PHPS)-derived silica (PDS) waterproof thin layers synthesized by curing at 60 °C for 1 h and allowed to stand for 48 h at 20 °C on various kinds of substrates was studied. Neutron reflectivity (NR) analysis suggested that uniform PDS thin layers were synthesized on the substrates, and the density of the layers varied depending on the type of substrate. Additionally, since the change in PDS density is correlated with the p K a value of the OH group on the substrate, it can be suggested that the acidity of the substrate would be one of the main factors determining the density of the coated PDS thin layers. For the water penetration structure study, NR analysis revealed that the depth of water penetration into the PDS layers was below 500 ?, and the hydration number of the SiO 2 molecule was estimated to be 8.0–9.0. From these results, we concluded that water penetration occurred by the formation of water-pool structures in the PDS layers, and the randomly formed nano-air holes lead to a reduction in the probability of water penetration into the deep regions of the PDS layers.
机译:研究了全氢聚硅氮烷(PHPS)衍生的二氧化硅(PDS)防水薄层的结构,该薄层通过在60°C下固化1 h并在20°C下放置48 h在各种基材上合成。中子反射率(NR)分析表明,在基底上合成了均匀的PDS薄层,并且层的密度根据基底的类型而变化。此外,由于PDS密度的变化与基材上OH基团的p K a值相关,因此可以认为基材的酸度将是决定涂覆的PDS薄层密度的主要因素之一。 。对于水渗透结构研究,NR分析表明,水渗透到PDS层中的深度低于500?,而SiO 2分子的水合数估计为8.0-9.0。根据这些结果,我们得出结论,水渗透是通过在PDS层中形成水坑结构而发生的,而随机形成的纳米气孔会导致水渗透到PDS层深部区域的可能性降低。

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