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COMPARATIVE STUDIES OF THE PROPERTIES OF THERMAL ANNEALED Sb2S3THIN FILMS

机译:热退火Sb2S3薄膜的性能比较研究

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In the present paper, we report the growth of antimony sulphide (Sb2S3) thin films by thermal evaporation method and detailed characterization of these films. The films were deposited from a Sb2S3powder at unheated substrates. We have analysed the structural, optical morphological and electrical properties of as deposited Sb2S3 films as well as those subjected to annealing in nitrogen atmosphere in the temperature range 100-300°C. As-deposited films are amorphous to X-ray diffraction (XRD). Polycrystalline antimony sulphide films are obtained and enhanced from the annealing temperature above 200°C. Both amorphous and polycrystalline antimony sulphide films have strong absorption coefficients in the range 104-5×105cm.1, and have direct band gaps with band energies 2-2.2 eV for the films annealed below 200°C and 1.7-1.8 eV for the films annealed at temperatures higher than 200°C. Inside, the thermal activation energy decreased with increasing annealed temperature for thins films treated in nitrogen atmosphere
机译:在本文中,我们报道了通过热蒸发法生长的锑化锑(Sb2S3)薄膜及其详细表征。薄膜是从Sb2S3粉末沉积在未加热的基材上的。我们已经分析了沉积的Sb2S3薄膜以及在100-300°C的氮气氛中进行退火的薄膜的结构,光学形态和电学性质。沉积的薄膜对于X射线衍射(XRD)是非晶的。获得了多晶硫化锑膜,并在高于200°C的退火温度下将其增强。无定形和多晶硫化锑薄膜在104-5×105cm.1的范围内都具有很强的吸收系数,并且在200°C以下退火的薄膜具有带能为2-2.2 eV的直接带隙,薄膜的能隙为1.7-1.8 eV在高于200°C的温度下退火。在内部,氮气氛下处理的薄膜的热活化能随退火温度的升高而降低

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