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Formation mechanism of overlapping grain boundaries in graphene chemical vapor deposition growth

机译:石墨烯化学气相沉积生长中晶界重叠的形成机理

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The formation of grain boundaries (GBs) in graphene films is both fundamentally interesting and practically important for many applications. A GB in graphene is known as a linear defect and is formed during the coalescence of two single crystalline graphene domains. The covalent binding between domains is broadly known as the mechanism of GB formation during graphene chemical vapor deposition (CVD) growth. Here, we demonstrate another GB formation mechanism, where two graphene domains are connected by weak van der Waals interactions between overlapping graphene layers. The formation mechanism of the overlapping GBs (OLGBs) is systematically explored theoretically and the proposed conditions for forming OLGBs are validated by experimental observations. This discovery leads to a deep understanding of the mechanism of graphene CVD growth and reveals potential means for graphene quality control in CVD synthesis.
机译:对于许多应用而言,石墨烯薄膜中晶界(GBs)的形成从根本上来说既有趣,又在实践中很重要。石墨烯中的GB被称为线性缺陷,是在两个单晶石墨烯结构域聚结期间形成的。域之间的共价结合被广泛称为石墨烯化学气相沉积(CVD)生长期间GB形成的机制。在这里,我们演示了另一种GB形成机理,其中两个石墨烯结构域通过重叠的石墨烯层之间的弱范德华相互作用连接。从理论上系统地研究了重叠GBs(OLGBs)的形成机理,并通过实验观察验证了提出的形成OLGBs的条件。这一发现导致人们对石墨烯CVD生长机理的深入了解,并揭示了在CVD合成中控制石墨烯质量的潜在手段。

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