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Fabrication of CIGS films by one-step pulseelectrodeposition on Mo/SLG substrates

机译:在Mo / SLG基板上通过一步脉冲电沉积制备CIGS膜

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In this study, we used low-cost non-vacuum electrochemical coating methodsto prepare Cu (In 1-x Ga x ) Se 2 precursor films on Mo/SLG substrates for the CIGS absorber applications. To find the most suitable growth conditions, we applied two types of electrodeposition conditions: the co nstantpotentialelectrodeposition and pulsed electrodeposition . To examine the material properties of the film, t he surface morphology, composition, and crystal structure analyses of the CIGS films were investigated b y scanning electron microscope (SEM), energy dispersive spectroscop y (EDS) and X -ray diffraction (XRD), respectively.The results sho w that pulse electrodeposition process with an appropriate duty cycle, pulse period and depositionvoltage could significantly improve the CIGS film quality. The pulse deposited CIGS films show promises for future CIGS solar cell applications.
机译:在这项研究中,我们使用低成本的非真空电化学镀膜方法在Mo / SLG衬底上制备用于CIGS吸收剂的Cu(In 1-x Ga x)Se 2前驱膜。为了找到最合适的生长条件,我们应用了两种类型的电沉积条件:恒电位电沉积和脉冲电沉积。为了检查薄膜的材料特性,通过扫描电子显微镜(SEM),能量色散光谱(EDS)和X射线衍射(XRD)研究了CIGS薄膜的表面形态,组成和晶体结构,结果表明,在适当的占空比,脉冲周期和沉积电压下进行脉冲电沉积工艺可以显着改善CIGS膜的质量。脉冲沉积的CIGS薄膜显示了未来CIGS太阳能电池应用的前景。

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