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Influence of Ga composition on CuInGaSe2 films using one-step electrochemical deposition methods

机译:一步法电化学沉积Ga组成对CuInGaSe 2 膜的影响

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CIGS film was formed using one-step electrochemical deposition at various deposition potential voltages in solution with diverse pH values. Multiple material analyses such as X-ray diffraction (XRD) analysis, scanning electron microscope (SEM) images, energy dispersive spectroscopy (EDS), and electron probe micro-analyzer (EPMA) images were used to examine the electro-deposition parameters. UV spectrometer was performed to measure the bandgap of the CIGS thin film. A highest Ga composition could be obtained at the most negative voltage of -3.3V and the smallest pH value of 1.6 in our experiment. However, an inferior material property and worse crystalline phase might come with a high Ga concentration. The band gap of the electro-deposited CIGS film with Cu:In:Ga:Se ratio of 1:0.52:0.30:1.98 could achieve 1.16 eV. The electrodeposited CIGS film shows promises for future solar cell applications.
机译:CIGS膜是在不同pH值的溶液中以各种沉积电位电压通过一步电化学沉积形成的。使用多种材料分析,例如X射线衍射(XRD)分析,扫描电子显微镜(SEM)图像,能量色散光谱(EDS)和电子探针微分析仪(EPMA)图像来检查电沉积参数。进行紫外光谱仪以测量CIGS薄膜的带隙。在我们的实验中,在最大负电压-3.3V和最小pH值1.6时,可以获得最高的Ga组成。但是,高Ga含量可能会导致材料性能差和结晶相差。 Cu:In:Ga:Se比为1:0.52:0.30:1.98的电沉积CIGS薄膜的带隙可以达到1.16 eV。电沉积CIGS膜显示了未来太阳能电池应用的前景。

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