RESISTANCE AND RESISTIVITIES OF PbS THIN FILMS USING POLYETHYLENIMINE BY CHEMICAL BATH DEPOSITION

摘要

In this work resistance and resistivities of PbS thin films by chemical bath deposition using Polyethylenimine as complexing agent are presented. A series of resistance and resistivity values of thin films obtained at different deposition times of 7, 10 and 13 minutes were evaluated and compared. The obtained films were chemically characterized by X-Ray Photoelectron and Raman spectroscopy confirming the presence of lead and sulfur as PbS. Thickness of the films was measured by ellipsometric spectroscopy; the values were in the range of 80 to 100 nm. Resistivity of the films was measured indirectly using an integrator circuit, the results show that resistivity values vary as a function of the deposition time. PEI films showed a low transmission in the visible range about 2 to 5% and an irregular absorption in the range of 300 to 1050 nm. Roughness of the films was characterized by atomic force microscopy showing values of mean square roughness of 16 nm, presenting different orientation of the clusters and pyramidal shapes.