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INFLUENCE OF COMPOSITION ON THE OPTICAL BAND GAP IN A-Ge20Se80-XInXTHIN FILMS

机译:组成对A-Ge20Se80-XInXTHIN薄膜的光学带隙的影响

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Thin films of Ge10Se80-xInx(x = 0, 5, 10, 15, 20) bulk material were prepared by thermal evaporation technique at a base pressure of ~10-6 mbar. Amorphous nature of the bulk and deposited thin films was confirmed by x-ray diffraction technique. Optical transmission spectra of the films were taken in the range of 400-1200 nm. The optical band gap was determined and the variation in the band gap is explained in terms of average bond energy of the system
机译:通过热蒸发技术在约10-6 mbar的基本压力下制备Ge10Se80-xInx(x = 0、5、10、15、20)块状材料的薄膜。通过X射线衍射技术证实了块状和沉积的薄膜的非晶性。膜的光学透射光谱在400-1200nm的范围内获得。确定了光学带隙,并根据系统的平均键能解释了带隙的变化

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