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Properties of thin films based on paraffin doped chalcogenides, prepared by pulse laser deposition(

机译:脉冲激光沉积制备的基于石蜡掺杂硫族化物的薄膜的性能(

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A chalcogenide material of composition Se42S58, doped by 10 wt.% paraffins has been prepared as thin films by pulsed laser deposition. The structural properties of the films have been investigated by X-ray diffraction. Sample stabilization was carried out by annealing at temperatures around 100 oC
机译:已经通过脉冲激光沉积将组成为Se42S58的硫属元素化物材料掺杂了10重量%的石蜡制成薄膜。通过X射线衍射研究了膜的结构性质。通过在约100 oC的温度下进行退火来稳定样品

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