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首页> 外文期刊>Bulletin of materials science >Characterization of nanocrystalline cadmium telluride thin films grown by successive ionic layer adsorption and reaction (SILAR) method
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Characterization of nanocrystalline cadmium telluride thin films grown by successive ionic layer adsorption and reaction (SILAR) method

机译:连续离子层吸附与反应(SILAR)法生长的纳米晶碲化镉薄膜的表征

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Structural, electrical and optical characteristics of CdTe thin films prepared by a chemical deposition method, successive ionic layer adsorption and reaction (SILAR), are described. For deposition of CdTe thin films, cadmium acetate was used as cationic and sodium tellurite as anionic precursor in aqueous medium. In this process hydrazine hydrate is used as reducing agent and NH4OH as the catalytic for the decomposition of hydrazine. By conducting several trials optimization of the adsorption, reaction and rinsing time duration for CdTe thin film deposition was done. In this paper the structural, optical and electrical properties of CdTe film are reported. The XRD pattern shows that films are nanocrystalline in nature. The resistivity is found to be of the order of 4.11 ?— 103 e??o-cm at 523 K temperature with an activation energy of a?? 0.2 eV. The optical absorption studies show that films have direct band gap (1.41 eV).
机译:描述了通过化学沉积方法制备的CdTe薄膜的结构,电学和光学特性,连续的离子层吸附和反应(SILAR)。对于CdTe薄膜的沉积,醋酸镉被用作阳离子,碲化钠被用作水性介质中的阴离子前体。在该方法中,水合肼用作还原剂,NH 4 OH用作肼分解的催化剂。通过进行几次试验,对CdTe薄膜沉积的吸附,反应和漂洗时间进行了优化。本文报道了CdTe薄膜的结构,光学和电学性质。 XRD图谱表明膜本质上是纳米晶体。发现在523 K温度下的电阻率约为4.11?— 10 3 e ?? o-cm,活化能为a?。 0.2 eV。光学吸收研究表明,薄膜具有直接的带隙(1.41 eV)。

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