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The effect of indium impurity on the DC-etching behaviour of aluminium foil for electrolytic capacitor usage

机译:铟杂质对电解电容器用铝箔的直流蚀刻行为的影响

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摘要

The effects of indium impurity on the etched morphology of high purity aluminium foils for electrolytic capacitor useage were investigated. The indium impurity was present either in as-received aluminium foils or deposited purposely on the foil surface through immersion-reduction reaction. The rolling line effect can be improved through introducing deposited indium on foil surfaces by immersion of the foil into In(NO_3)_3 solution prior to DC-etching. Under a high immersion temperature and more concentrated in(NO_3)_3 condition, surface etching competes with tunnel etching, and the foil thickness clearly decreases.
机译:研究了铟杂质对电解电容器用高纯铝箔腐蚀形态的影响。铟杂质存在于原样的铝箔中,或者通过浸没-还原反应故意沉积在箔表面上。通过在直流蚀刻之前将箔浸入In(NO_3)_3溶液中,在箔表面上引入沉积的铟,可以改善轧制线效果。在较高的浸入温度下,在(NO_3)_3条件下浓度更高时,表面蚀刻与隧道蚀刻竞争,箔厚度明显减小。

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