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Discrete dislocation simulation of nanoindentation

机译:纳米压痕的离散位错模拟

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A methodology to describe nanoindentation by means of discrete dislocations is presented. A collocation method is used to calculate the arising contact stresses at each indentation step, which permits to realize an arbitrary shape of the indenter. Distributed dislocation sources are allowed to emit dislocations on predefined slip planes, when the critical value of the local shear stress for the emission is reached. After each indentation step, the newly emitted dislocations are brought to their equilibrium positions under the influence of the stresses induced by the contact stresses and the dislocations. As an application of our model, the plastic behavior of two materials with different densities of dislocation sources will be studied in detail.
机译:提出了一种通过离散位错描述纳米压痕的方法。搭配方法用于计算每个压痕步骤中产生的接触应力,从而可以实现压头的任意形状。当达到发射的局部剪切应力的临界值时,允许分布的位错源在预定义的滑动面上发射位错。在每个压痕步骤之后,新产生的位错在接触应力和位错引起的应力的影响下达到其平衡位置。作为我们模型的应用,将详细研究位错密度不同的两种材料的塑性行为。

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