首页> 外文期刊>IEEE Circuits & Devices >Efficient subthreshold leakage current optimization - Leakage current optimization and layout migration for 90- and 65- nm ASIC libraries
【24h】

Efficient subthreshold leakage current optimization - Leakage current optimization and layout migration for 90- and 65- nm ASIC libraries

机译:高效的亚阈值泄漏电流优化-90和65 nm ASIC库的泄漏电流优化和布局移植

获取原文
获取原文并翻译 | 示例
           

摘要

Leakage current is of great concern for designs in nanometer technologies. In 90- and 65-nm technologies, subthreshold leakage current dominates total leakage current. For a typical ASIC circuit running at several hundred megahertz frequencies, the subthreshold leakage power can be as high as 60% of total power. An important method for minimizing power in ASIC libraries is reducing leakage current. In this article, a complete automated leakage optimization flow that changes channel lengths and widths with cell delay and active area constraints was discussed. Optimization results show that there is ~30% leakage current reduction with a few percent active area and delay increase. There is increase in dynamic power, but the net total power reduction is significant. A uniform increase of 10% in gate length results in ~35% leakage reduction at the cost of ~12% delay degradation. The total cell area changes are minimal in both cases. The optimization flow begins with SPICE net lists from an existing library, optimizes leakage currents subject to performance metrics and active area increase constraints, and finishes with new layout generation and characterization. Investigations indicate that the leakage optimization has little impact on cell noise margin and layout parasitic modifications do not affect optimization results. The efficient automatic layout-to-layout cell leakage optimization flow is most suitable for leakage minimization and library migration for 90- and 65-nm ASIC libraries. Future work includes applying the flow to situations where layout-dependent DFM and process variation objective functions are also optimized
机译:漏电流是纳米技术设计中非常关注的问题。在90纳米和65纳米技术中,亚阈值泄漏电流主导着总泄漏电流。对于以几百兆赫兹频率运行的典型ASIC电路,亚阈值泄漏功率可能高达总功率的60%。最小化ASIC库中功耗的一种重要方法是降低漏电流。在本文中,讨论了一个完整的自动泄漏优化流程,该流程会随着单元延迟和有源区域约束而更改通道的长度和宽度。优化结果表明,漏电流减少了约30%,有效面积减小了几步,延迟增加了。动态功率有所增加,但净总功率的减少却很明显。栅极长度的10%均匀增加会导致〜35%的泄漏减少,代价是〜12%的延迟衰减。在两种情况下,总的细胞面积变化是最小的。优化流程从现有库中的SPICE网络列表开始,根据性能指标和有效面积增加约束来优化泄漏电流,并以新的布局生成和特性结束。研究表明,泄漏优化对电池噪声容限几乎没有影响,布局寄生修改不会影响优化结果。高效的自动布局到布局单元泄漏优化流程最适合用于90和65 nm ASIC库的泄漏最小化和库迁移。未来的工作包括将流程应用于与布局相关的DFM和流程变化目标函数也得到优化的情况

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号