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首页> 外文期刊>Circuits, Devices & Systems, IET >Role of grooving angle of 14-nm-InAs channel quantum well MOSFETs in improving analogue/RF and linearity performance
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Role of grooving angle of 14-nm-InAs channel quantum well MOSFETs in improving analogue/RF and linearity performance

机译:14nm-InAs沟道量子阱MOSFET的切槽角在改善模拟/ RF和线性性能中的作用

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The authors investigate and physically analyse the effects of the angle of grooving (theta) on various analogues and RF parameters of InAs-channel quantum well MOSFETs with raised source/drain architecture at a 14-nm gate length. Moreover, harmonic distortion analysis is performed to examine the linearity and distortion of common source amplifiers built with such transistors. The findings reveal that the device with theta = 20 degrees exhibits significant improvement in transconductance efficiency (g(m)/I-DS), output resistance (r(d)), and voltage gain (A(v)) while showing degradation in transconductance (g(m)) compared to the corresponding parameter with theta = 90 degrees. Furthermore, the obtained results manifest that the total harmonic distortion drops to -47 dB for an amplifier built with the device having theta = 90 degrees compared to -22 dB obtained with theta = 20 degrees. Notably, as the angle of grooving increases from 20 degrees to 90 degrees, the gain bandwidth of the amplifier improves by 232% while the peak gain falls by 40%.
机译:作者研究并物理分析了开槽角(θ)对栅极长度为14 nm的具有升高的源/漏结构的InAs沟道量子阱MOSFET的各种类似物和RF参数的影响。此外,进行谐波失真分析以检查由这种晶体管构成的共源放大器的线性和失真。结果表明,θ= 20度的器件在跨导效率(g(m)/ I-DS),输出电阻(r(d))和电压增益(A(v))方面均表现出显着改善,而在跨导(g(m))与theta = 90度的相应参数进行比较。此外,获得的结果表明,与使用θ= 20度获得的-22 dB相比,对于使用θ= 90度的器件构建的放大器,总谐波失真降至-47 dB。值得注意的是,随着开槽角度从20度增加到90度,放大器的增益带宽提高了232%,而峰值增益下降了40%。

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