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机译:14nm-InAs沟道量子阱MOSFET的切槽角在改善模拟/ RF和线性性能中的作用
Future Inst Technol Kolkata 700154 India;
Jadavpur Univ Dept Elect & Telecommun Engn Kolkata 700032 India;
Univ Calcutta Inst Radio Phys & Elect Kolkata 700009 India;
MOSFET; indium compounds; harmonic distortion; semiconductor quantum wells; linearity performance; RF parameters; harmonic distortion analysis; common source amplifiers; transconductance efficiency; output resistance; voltage gain; total harmonic distortion; channel quantum well MOSFETs; grooving angle; analogue-RF performance; source-drain architecture; transistors; noise figure-47; 0 dB; noise figure-22; 0 dB; InAs;
机译:用于改善短沟道性能的纳米级线性梯度二元金属合金栅极圆柱形无结MOSFET的全面二维分析研究
机译:双轴压缩应变$ hbox {Si} _ {0.5} hbox {Ge} _ {0.5} $沿$ langle hbox {110} rangle $和$的量子阱pMOSFET的状态性能增强和与通道方向相关的性能langle hbox {100} rangle $频道方向
机译:用于模拟/混合信号应用的双材料栅极短沟道BULK MOSFET的性能和优化
机译:具有锗大角度倾斜注入和预非晶化的低热预算自对准硅化物,可改善薄膜SOI MOSFET的性能
机译:用于亚22纳米节点数字CMOS逻辑技术的基于锗的量子阱沟道MOSFET的工艺集成和性能评估
机译:GE N沟道MOSFET具有ZrO2电介质实现改进的移动性
机译:锥形沟道纳米线MOSFET改善性能的可行性研究