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Single bit-line 8T SRAM cell with asynchronous dual word-line control for bit-interleaved ultra-low voltage operation

机译:具有异步双字线控制的单位线8T SRAM单元,用于位交错的超低压操作

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摘要

This study proposes a single bit-line and disturbance-free static random-access memory (SRAM) cell for ultra-low voltage applications. SRAM cell with read-decoupled and cross-point structure addresses both the read-disturb and half-select stability issues; nevertheless, the write-ability is degraded due to the stacked pass transistors. In this study, the authors propose a single-ended 8T bit-cell and dual word-line control technique that can simultaneously improve the read stability, half-select stability, and write-ability without additional peripheral circuits, which is advantageous for bit-interleaved ultra-low voltage operations. A 4 kb test chip was implemented in a 90 nm complementary metal-oxide-semiconductor process to verify the proposed design. Silicon measurements indicate that the proposed design can operate at a voltage as low as 360 mV with 2.68 μW power consumption.
机译:这项研究提出了一种用于超低压应用的单位线无干扰静态随机存取存储器(SRAM)单元。具有读取解耦和交叉点结构的SRAM单元解决了读取干扰和半选择稳定性问题。然而,由于堆叠的传输晶体管,写入能力下降。在这项研究中,作者提出了一种单端8T比特单元和双字线控制技术,该技术可以在不增加外围电路的情况下同时提高读取稳定性,半选择稳定性和可写性,这对于位加密非常有利。交错式超低压操作。在90 nm互补金属氧化物半导体工艺中实施了4 kb测试芯片,以验证所提出的设计。硅片测量表明,提出的设计可以在低至360 mV的电压下工作,功耗为2.68μW。

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