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Influence of ion species ratio on grid-enhanced plasma source ion implantation

机译:离子种类比对栅极增强等离子体源离子注入的影响

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摘要

Grid-enhanced plasma source ion implantation (GEPSII) is a newly proposed technique to modify the inner-surface properties of a cylindrical bore. In this paper, a two-ion fluid model describing nitrogen molecular ions N_2~+ and atomic ions N~+ is used to investigate the ion sheath dynamics between the grid electrode and the inner surface of a cylindrical bore during the GEPSII process, which is an extension of our previous calculations in which only N_2~+ was considered. Calculations are concentrated on the results of ion dose and impact energy on the target for different ion species ratios in the core plasma. The calculated results show that more atomic ions N~+ in the core plasma can raise the ion impact energy and reduce the ion dose on the target.
机译:网格增强等离子体源离子注入(GEPSII)是一种新提出的技术,用于修改圆柱孔的内表面特性。本文采用描述氮分子离子N_2〜+和原子离子N〜+的双离子流体模型,研究了GEPSII过程中栅电极与圆柱孔内表面之间的离子鞘动力学。我们以前的计算的扩展,其中只考虑了N_2〜+。计算重点是针对核心等离子体中不同离子物种比率的离子剂量和对靶的冲击能量的结果。计算结果表明,核心等离子体中更多的原子离子N〜+可以提高离子碰撞能量,减少靶上的离子剂量。

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