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Oxidative stress in bacteria (Pseudomonas putida) exposed to nanostructures of silicon carbide

机译:暴露于碳化硅纳米结构中的细菌(恶臭假单胞菌)的氧化应激

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摘要

Silicon carbide (SiC) nanostructures produced by combustion synthesis can cause oxidative stress in the bacterium Pseudomonas putida. The results of this study showed that SiC nanostructures damaged the cell membrane, which can lead to oxidative stress in living cells and to the loss of cell viability. As a reference, micrometric SiC was also used, which did not exhibit toxicity toward cells. Oxidative stress was studied by analyzing the activity of peroxidases, and the expression of the glucose-6-phosphate dehydrogenase gene (zwf1) using real-time PCR and northern blot techniques. Damage to nucleic acid was studied by isolating and hydrolyzing plasmids with the formamidopyrimidine [fapy]-DNA glycosylase (also known as 8-oxoguanine DNA glycosylase) (Fpg), which is able to detect damaged DNA. The level of viable microbial cells was investigated by propidium iodide and acridine orange staining. (C) 2015 Elsevier Ltd. All rights reserved.
机译:通过燃烧合成产生的碳化硅(SiC)纳米结构可以在恶臭假单胞菌中引起氧化应激。这项研究的结果表明,SiC纳米结构破坏了细胞膜,可能导致活细胞中的氧化应激并导致细胞活力丧失。作为参考,还使用了微米SiC,它对细胞没有毒性。使用实时荧光定量PCR和Northern印迹技术,通过分析过氧化物酶的活性以及葡萄糖6-磷酸脱氢酶基因(zwf1)的表达来研究氧化应激。通过用甲酰胺基嘧啶[fapy] -DNA糖基化酶(也称为8-氧代鸟嘌呤DNA糖基化酶)(Fpg)分离和水解质粒来研究核酸的损伤,该酶能够检测受损的DNA。通过碘化丙啶和a啶橙染色研究了存活的微生物细胞的水平。 (C)2015 Elsevier Ltd.保留所有权利。

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