Cobalt-palladium and cobalt-platinum bilayer films formed by chemical vapor deposition

摘要

The complexes [Co_3(CO)_9CCl], [Co_3(CO)_9CH], [Co_2(CO)_6 (CH≡CPh)and [Co_2(CO)_6 (HC≡C~t- Bu)] are shown to be excellent precursors for CVD of pure cobalt films, when using hydrogen as carrier gas. These compounds all possess good air and moisture stability, have high volatility, and are easy to prepare, store , and handle.