Spontaneous exfoliation and tailoring of MoS_2 in mixed solvents

摘要

Spontaneous exfoliation of MoS_2 is achieved in H_2O_2-NMP mixed solvents with a yield of over 60 wt%, operated under mild conditions. H_2O_2-prompted sheet-tailoring effect induces a size evolution of MoS_2 nanosheets from micro-scale to nano-scale. Furthermore, the concurrent dissolution also affords an approach to introduce structural defects in the nanosheets.