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Enhancement of Analyte lonization in Desoprtion/lonization on Porous Silicon (DIOS)-Mass Spectrometry (MS)

机译:多孔硅(DIOS)-质谱(MS)上解吸/电离中分析物电离的增强

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Desorption/ionization on silicon mass spectrometry (DIOS-MS) is a relatively new laser desorption/ionization technique for mass spectrometry without employing an organic matrix. This present study was carried to survey the experimental factors to improve the efficiency of DIOS-MS through electrochemical etching condition in structure and morphological properties of the porous silicon. The porous structure of silicon structure and its properties are crucial for the better performance of DIOS-MS and they can be controlled by the suitable selection of electrochemical conditions. The fabrication of porous silicon and ion signals on DIOS-MS were examined as a function of silicon orientation, etching time, etchant, current flux, irradiation, pore size, and pore depth. We have also examined the effect of pre- and post-etching conditions for their effect on DIOS-MS. Finally, we could optimize the electrochemical conditions for the efficient performance of DIOS-MS in the analysis of small molecule such as amino acid, drug and peptides without any unknown noise or fragmentation.
机译:硅质谱解吸/电离(DIOS-MS)是一种相对较新的用于质谱分析的激光解吸/电离技术,无需使用有机基质。本研究旨在探讨通过电化学刻蚀条件提高多孔硅的结构和形貌性能的实验因素,以提高DIOS-MS的效率。硅结构的多孔结构及其性能对于DIOS-MS的更好性能至关重要,可以通过适当选择电化学条件来控制它们。检查了DIOS-MS上多孔硅和离子信号与硅取向,蚀刻时间,蚀刻剂,电流,通量,辐射,孔径和孔深度的关系。我们还检查了蚀刻前和蚀刻后条件对DIOS-MS的影响。最后,我们可以优化电化学条件,以实现DIOS-MS在分析小分子(例如氨基酸,药物和肽)时的高效性能,而不会产生任何未知的噪音或碎片。

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