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Plasma-treatment induced H_2O dissociation for the enhancement of photocatalytic CO_2 reduction to CH_4 over graphitic carbon nitride

机译:等离子体处理引起的H_2O离解,以增强石墨氮化碳对光催化CO_2还原为CH_4的作用

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摘要

Though graphitic carbon nitride (g-C3N4) is a star photocatalyst for CO2 reduction, its unsatisfactory efficiency and lower reduced-state product (primary product is CO) greatly limit the further application. Dissociation of H2O is known as key step to provide abundant protons for CO2 reduction. The sluggish kinetic of H2O dissociation on g-C3N4 restricts the generation of higher reduced-state hydrocarbon products. Herein, we designed holey g-C3N4 nanosheets with numerous surface defects by Ar plasma treatment. Density functional theoretical (DFT) calculations prove the Ar plasma-treated g-C3N4 (P-x-CN) exhibits better H2O adsorption and dissociation abilities than pure g-C3N4. The separation of photogenerated charge carriers in P-x-CN is also more efficient than pure g-C3N4, which offers higher density of surface photogenerated electrons. The probability of multiple electron reduction reactions to hydrocarbon products greatly increases. As a result, the optimal Ar plasma-treated g-C3N4 (P-80-CN) shows a 40 times higher efficiency of CO2 reduction to CH4 than the pure g-C3N4. This work demonstrates the important role of H2O adsorption and dissociation in tuning product selectivity of CO2 reduction reactions, and provides an effective plasma treatment to modify the surface structure of photocatalysts.
机译:尽管石墨碳氮化物(g-C3N4)是用于还原CO2的星形光催化剂,但其令人满意的效率和较低的还原态产物(主要产物为CO)极大地限制了其进一步的应用。 H2O的离解是为减少CO2提供大量质子的关键步骤。 H-O在g-C3N4上的解离动力学缓慢,限制了高还原态烃产物的产生。本文中,我们通过Ar等离子体处理设计了具有许多表面缺陷的多孔g-C3N4纳米片。密度泛函理论(DFT)计算证明,用Ar等离子体处理过的g-C3N4(P-x-CN)表现出比纯g-C3N4更好的H2O吸附和离解能力。 P-x-CN中光生电荷载流子的分离也比纯g-C3N4更有效,后者提供了更高的表面光生电子密度。多次电子还原反应生成烃类产物的可能性大大增加。结果,最佳的Ar等离子体处理过的g-C3N4(P-80-CN)显示出将CO2还原成CH4的效率是纯g-C3N4的40倍。这项工作证明了H2O吸附和解离在调节CO2还原反应的产物选择性中的重要作用,并提供了有效的等离子体处理来修饰光催化剂的表面结构。

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