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Role of low energy transition metal ions in interface formation in ZnO thin films and their effect on magnetic properties for spintronic applications

机译:低能过渡金属离子在ZnO薄膜界面形成中的作用及其对自旋电子学应用的磁性能的影响

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In this study, X-ZnO/ZnO/Si(100) (X = Co, Ni and Cu) bilayer structure is fabricated using low energy ion implantation technique. Five different fluences 1 x 10(15), 5 x 10(15), 1 x 10(16), 2.5 x 10(16) and 5 x 10(16) ions/cm(2) with 100 keV ion-beam energy were selected in order to implant the ions up to the depth of approximate to 44 nm as calculated through Stopping Range of Ion in Matter and Transport Range of Ions in Matter software. Structural modification was investigated by high resolution X-ray diffraction measurements in ZnO bilayer system. An observed systematic 2 theta shift in (002) peak with increasing fluence implies increased density of implanted metal ions in ZnO matrix revealing the substitution of implanted ion at Zn-site. The mechanism of bilayer formation by ion-beam implantation technique has been discussed for metal-ions by investigating their interface properties. Atomic force microscopy reveals the morphological modification after ion implantation. Near-edge X-ray absorption fine-structure (NEXAFS) measurements at metal K- and L-3,L-2-edges have been used to investigate the nature of implanted ions in terms of their valance state and local electronic environment. Further, 0 K-edge NEXAFS measurement for Ni-ZnO/ZnO/Si bilayer is highly sensitive to incident beam angles whereas no spectral change is seen for Zn L-edge measurements. The magnetic measurements were performed via vibrating sample magnetometer that showed the films are ferromagnetic at room temperature. The origin of ferromagnetism has been understood through defect mediated bound magnetic polaron model. Further, perpendicular magnetic anisotropy is also observed for Ni-ZnO/ZnO/Si bilayer structure at room temperature, which is correlated with the angle dependent O K-edge NEXAFS measurements. Fabrication of ZnO bilayer via ion implantation and investigation of above properties may prove useful in spin related and optoelectronic applications.
机译:在这项研究中,使用低能离子注入技术制造了X-ZnO / ZnO / Si(100)(X = Co,Ni和Cu)双层结构。具有100 keV离子束能量的5种不同注量1 x 10(15),5 x 10(15),1 x 10(16),2.5 x 10(16)和5 x 10(16)离子/ cm(2)选择离子是为了将离子注入到大约44 nm的深度,这是通过“物质的离子停止范围”和“物质”软件中的离子传输范围计算得出的。通过在ZnO双层系统中的高分辨率X射线衍射测量研究了结构修饰。 (002)峰中观察到的系统2θ位移随着注量的增加而暗示ZnO基质中注入的金属离子的密度增加,揭示了Zn位置处注入离子的取代。通过研究金属离子的界面特性,讨论了通过离子束注入技术形成双层的机理。原子力显微镜显示离子注入后的形态变化。在金属K-和L-3,L-2-边缘的近边缘X射线吸收精细结构(NEXAFS)测量已用于研究注入离子的价态和局部电子环境的性质。此外,Ni-ZnO / ZnO / Si双层的0 K边缘NEXAFS测量对入射光束角高度敏感,而Zn L-edge测量没有光谱变化。通过振动样品磁力计进行磁性测量,结果表明该薄膜在室温下是铁磁性的。铁磁的起源已通过缺陷介导的束缚磁极化子模型得以理解。此外,在室温下还观察到Ni-ZnO / ZnO / Si双层结构的垂直磁各向异性,这与角度相关的O K-edge NEXAFS测量结果相关。通过离子注入制备ZnO双层膜并研究上述性能可证明在自旋相关和光电应用中很有用。

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