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首页> 外文期刊>Applied Surface Science >Interfacial properties of two-dimensional graphene/ZrS_2 and ScS_2/ZrS_2 contacts
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Interfacial properties of two-dimensional graphene/ZrS_2 and ScS_2/ZrS_2 contacts

机译:二维石墨烯/ ZrS_2和ScS_2 / ZrS_2接触件的界面性质

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摘要

The two dimensional device is a promising candidate for preparation of 'More than Moore' device. However, two dimensional device always exhibits relative weak on-current. In this work, graphene and monolayer ScS2 are used as metal electrode to contact with monolayer ZrS2. Using the first principle calculation, we analyze the electronic structures of the different types of metal/ZrS2 contact and figure out how the orbital coupling and charge transfer influence the interface barrier. The Ohmic contact can be obtained in vertical graphene/ZrS2 and in-plane ScS2/ZrS2 contacts, implying high carrier injection efficiency can be achieved in the contacts. The tunneling probability is larger than 97% in all the contacts. Moreover, the strain can modulate the interfacial dipole moment and the mutual transformation of Schottky contact and Ohmic contact. In particular, compressive strain is conducive to improve the carrier injection efficiency. In addition, a low resistance junction is designed based on ScS2/ZrS2/graphene contact and the multifunction of the junction may be achieved with electrostatic doping. The results provide guidelines for designing low-resistance two dimensional ZrS2 device.
机译:二维装置是制备“比摩尔更大”装置的有希望的候选者。但是,二维器件始终表现出相对较弱的导通电流。在这项工作中,石墨烯和单层ScS2被用作与单层ZrS2接触的金属电极。使用第一原理计算,我们分析了不同类型的金属/ ZrS2触点的电子结构,并弄清了轨道耦合和电荷转移如何影响界面势垒。可以在垂直石墨烯/ ZrS2和面内ScS2 / ZrS2接触中获得欧姆接触,这意味着可以在接触中实现高载流子注入效率。在所有接触中,隧穿概率均大于97%。此外,应变可以调节界面偶极矩以及肖特基接触和欧姆接触的相互转换。特别地,压缩应变有利于提高载流子注入效率。此外,基于ScS2 / ZrS2 /石墨烯触点设计了低电阻结,并且可以通过静电掺杂实现结的多功能。结果为设计低阻二维ZrS2器件提供了指导。

著录项

  • 来源
    《Applied Surface Science 》 |2019年第15期| 778-788| 共11页
  • 作者单位

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Zhengzhou Normal Univ, Sch Phys & Elect Engn, Zhengzhou 450044, Henan, Peoples R China;

    Henan Normal Univ, Coll Phys & Mat Sci, Xinxiang 453007, Henan, Peoples R China|Zhengzhou Normal Univ, Sch Phys & Elect Engn, Zhengzhou 450044, Henan, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

    Beijing Univ Posts & Telecommun, Sch Sci, Lab Informat Funct Mat & Devices, Beijing 100876, Peoples R China|Beijing Univ Posts & Telecommun, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    2D metal/semiconductor contacts; Interfacial property; Schottky barrier;

    机译:二维金属/半导体触点;界面性质;肖特基势垒;

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