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Structural and ferroelectric properties of (Bi,Ce)_4Ti_3O_(12) thin films grown by pulsed laser deposition for ferroelectric random access memories

机译:铁电随机存取存储器通过脉冲激光沉积生长的(Bi,Ce)_4Ti_3O_(12)薄膜的结构和铁电性能

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摘要

The (Bi_(3.25)Ce_(0.75))Ti_3O_(12) (BCT) thin films with Bi-excess composition were prepared onto Pt/TiO_2/SiO_2/Si substrates at various temperatures using pulsed laser deposition (PLD) and annealed at various temperatures. The 20 mol% Bi-excess BCT films deposited at 400 ℃ showed a pure layered structure, the lowest root mean square (rms) roughness, and good ferroelectric properties after annealing at 700 ℃ in an oxygen ambient. The 70 nm thick-BCT films annealed at 800 ℃ for 10 min in O_2 showed well-saturated P-E-curves at an applied electric field of 3 V and a 2P_r of 23 μC/cm~2 and a E_c of 180 kV/cm at 5 V. The polarization values were not significantly changed after being subjected to 1.0 x 10~(10) switching cycles.
机译:使用脉冲激光沉积(PLD)在不同温度下将具有Bi过量组成的(Bi_(3.25)Ce_(0.75)Ti_3O_(12)(BCT)薄膜制备到Pt / TiO_2 / SiO_2 / Si衬底上并在不同温度下退火温度。 400℃下沉积的20 mol%Bi-多余BCT膜在氧气环境中于700℃退火后显示出纯的层状结构,最低的均方根(rms)粗糙度和良好的铁电性能。 70纳米厚的BCT薄膜在O_2中于800℃退火10分钟,在3 V的施加电场和23μC/ cm〜2的2P_r和180 kV / cm的E_c时显示出饱和的PE曲线。 5V。经过1.0 x 10〜(10)的开关周期后,偏振值没有明显变化。

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